JPH0149786B2 - - Google Patents

Info

Publication number
JPH0149786B2
JPH0149786B2 JP7903781A JP7903781A JPH0149786B2 JP H0149786 B2 JPH0149786 B2 JP H0149786B2 JP 7903781 A JP7903781 A JP 7903781A JP 7903781 A JP7903781 A JP 7903781A JP H0149786 B2 JPH0149786 B2 JP H0149786B2
Authority
JP
Japan
Prior art keywords
electron beam
vapor deposition
evaporation
guide plate
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7903781A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57194252A (en
Inventor
Makoto Nagao
Akira Nahara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP7903781A priority Critical patent/JPS57194252A/ja
Priority to DE19823204337 priority patent/DE3204337A1/de
Publication of JPS57194252A publication Critical patent/JPS57194252A/ja
Publication of JPH0149786B2 publication Critical patent/JPH0149786B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
JP7903781A 1981-02-10 1981-05-25 Vapor depositing device by electron beam Granted JPS57194252A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP7903781A JPS57194252A (en) 1981-05-25 1981-05-25 Vapor depositing device by electron beam
DE19823204337 DE3204337A1 (de) 1981-02-10 1982-02-09 Verfahren und vorrichtung zum bilden eines duennen films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7903781A JPS57194252A (en) 1981-05-25 1981-05-25 Vapor depositing device by electron beam

Publications (2)

Publication Number Publication Date
JPS57194252A JPS57194252A (en) 1982-11-29
JPH0149786B2 true JPH0149786B2 (en]) 1989-10-26

Family

ID=13678712

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7903781A Granted JPS57194252A (en) 1981-02-10 1981-05-25 Vapor depositing device by electron beam

Country Status (1)

Country Link
JP (1) JPS57194252A (en])

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59222578A (ja) * 1983-05-30 1984-12-14 Hitachi Condenser Co Ltd 蒸着装置
JPS63204513A (ja) * 1987-02-20 1988-08-24 Fuji Photo Film Co Ltd 磁気記録媒体の製造装置
TWI472639B (zh) 2009-05-22 2015-02-11 Samsung Display Co Ltd 薄膜沉積設備
KR101127575B1 (ko) 2009-08-10 2012-03-23 삼성모바일디스플레이주식회사 증착 가림막을 가지는 박막 증착 장치
KR101084194B1 (ko) 2009-08-10 2011-11-17 삼성모바일디스플레이주식회사 증착 가림막을 가지는 박막 증착 장치
US8696815B2 (en) 2009-09-01 2014-04-15 Samsung Display Co., Ltd. Thin film deposition apparatus
KR101084184B1 (ko) 2010-01-11 2011-11-17 삼성모바일디스플레이주식회사 박막 증착 장치
KR101760897B1 (ko) 2011-01-12 2017-07-25 삼성디스플레이 주식회사 증착원 및 이를 구비하는 유기막 증착 장치

Also Published As

Publication number Publication date
JPS57194252A (en) 1982-11-29

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